China National Intellectual Property Administration, Announcement on Relevant Period Matters for Patents, Trademarks and Integrated Circuit Layout Designs Affected by the Epidemic

国家知识产权局关于专利、商标、集成电路布图设计受疫情影响相关期限事项的公告

Extensions may be granted to IP applications due to coronavirus obstruction

3 minute read March 06, 2020 at 03:08 AM

Susan Mok

Issued: January 28, 2020

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